Depositionrate相关论文
对比研究了直流磁控溅射(dcMS)、高功率脉冲磁控溅射(HPPMS)和调制脉冲磁控溅射(MPPMS)所沉积纳米晶TiN薄膜的组织结构与力学性能.......
Titanium thin films are extensively used in aerospace engineering, medical instrument and optical and microelectronic fi......
Deposition of Hydrogenated Diamond Like Carbon Films in Acetylene-fed Filtered Cathodic Vacuum Arc E
Diamond like Carbon (DLC) films are really the general term of a serials of carbon films, which is, consist of sp2 and s......
High Power Impluse Magenetron Sputtering (HiPIMS) is featured by high ionization rate, high adhesion between film and su......
This study prepared Mo sputtering targets with different microstructures and textures through using several metallurgica......
Through discrete method of numerical calculation, it infers Second order upwind scheme addition item in the staggered me......
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During fabricating hydrogenated silicon films using plasma enhanced chemical vapor deposition method (PECVD),the interac......
Drastically different two-phase microstructures have been reported for alloy epitaxial films,including self-organized na......
以四异丙醇钛为钛源物质，采用常压化学气相沉积法制备了ＴｉＯ２膜，并对其光学性质进行了研究。实验结果表明，：沉积条件是影响ＴｉＯ２膜的沉积率和光学......
A new catalytic chemical vapor process for depositing silicon nitride films using silane hydrazine gaseous mixture is de......
采用等离子体增强金属有机化合物化学气相沉积（ＰＥＭＯＣＶＤ）工艺，在氧化性气氛（Ｏ２）和非氧化性气氛（Ｈ２、Ａｒ）中制备了含铁聚合物杂混薄膜。探讨了工作气氛和偏......
